A robust approach for the growth of epitaxial spinel ferrite films

J. X. Ma; D. Mazumdar; G. Kim; H. Sato; N. Z. Bao; A. Gupta

doi:10.1063/1.3488638

A robust approach for the growth of epitaxial spinel ferrite films

J. X. Ma, D. Mazumdar, G. Kim, H. Sato, N. Z. Bao, A. Gupta

University of Alabama

Research output: Contribution to journal › Article › peer-review

47 Scopus citations

Abstract

Heteroepitaxial spinel ferrites NiFe₂ O₄ and CoFe₂ O₄ films have been prepared by pulsed laser deposition at various temperatures (175-690 °C) under ozone/oxygen pressure of 10 mTorr. Due to enhanced kinetic energy of ablated species at low pressure and enhanced oxidation power of ozone, epitaxy has been achieved at significantly lower temperatures than previously reported. Films grown at temperature below 550 °C show a novel growth mode, which we term "vertical step-flow" growth mode. Epitaxial spinel ferrite films with atomically flat surface over large areas and enhanced magnetic moment can be routinely obtained. Interestingly, the growth mode is independent of the nature of substrate (spinel MgAl₂ O₄, perovskite SrTiO ₃, and rock-salt MgO) and film thickness. The underlying growth mechanism is discussed.

Original language	English
Article number	063917
Journal	Journal of Applied Physics
Volume	108
Issue number	6
DOIs	https://doi.org/10.1063/1.3488638
State	Published - 15 Sep 2010
Externally published	Yes

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abstract = "Heteroepitaxial spinel ferrites NiFe2 O4 and CoFe2 O4 films have been prepared by pulsed laser deposition at various temperatures (175-690 °C) under ozone/oxygen pressure of 10 mTorr. Due to enhanced kinetic energy of ablated species at low pressure and enhanced oxidation power of ozone, epitaxy has been achieved at significantly lower temperatures than previously reported. Films grown at temperature below 550 °C show a novel growth mode, which we term {"}vertical step-flow{"} growth mode. Epitaxial spinel ferrite films with atomically flat surface over large areas and enhanced magnetic moment can be routinely obtained. Interestingly, the growth mode is independent of the nature of substrate (spinel MgAl2 O4, perovskite SrTiO 3, and rock-salt MgO) and film thickness. The underlying growth mechanism is discussed.",

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AU - Ma, J. X.

AU - Mazumdar, D.

AU - Kim, G.

AU - Sato, H.

AU - Bao, N. Z.

AU - Gupta, A.

PY - 2010/9/15

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AB - Heteroepitaxial spinel ferrites NiFe2 O4 and CoFe2 O4 films have been prepared by pulsed laser deposition at various temperatures (175-690 °C) under ozone/oxygen pressure of 10 mTorr. Due to enhanced kinetic energy of ablated species at low pressure and enhanced oxidation power of ozone, epitaxy has been achieved at significantly lower temperatures than previously reported. Films grown at temperature below 550 °C show a novel growth mode, which we term "vertical step-flow" growth mode. Epitaxial spinel ferrite films with atomically flat surface over large areas and enhanced magnetic moment can be routinely obtained. Interestingly, the growth mode is independent of the nature of substrate (spinel MgAl2 O4, perovskite SrTiO 3, and rock-salt MgO) and film thickness. The underlying growth mechanism is discussed.

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A robust approach for the growth of epitaxial spinel ferrite films

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