TY - JOUR
T1 - Analysis of the corrosion failure of a semiconductor polycrystalline distillation column
AU - Sun, Peipei
AU - Wang, Zhirong
AU - Lu, Yawei
AU - Shen, Shuoxun
AU - Yang, Rongrong
AU - Xue, Anxue
AU - Parker, Trent
AU - Wang, Jian
AU - Wang, Qingsheng
N1 - Publisher Copyright:
© 2020 Institution of Chemical Engineers
PY - 2020/3
Y1 - 2020/3
N2 - Distillation column is a fundamental device for the production of the semiconductor polysilicon. Therefore, investigating corrosion leakage protection of the distillation column is of great significance because of the undetectable yet very significant consequences of corrosion leakage to the column. In this work, corrosion investigation of a polycrystalline silicon rectification tower is presented. The composition and crack morphology of the distillation column (316 L austenitic stainless steel) were detected and analysed using component and hardness analysers. The effects of pH and temperature on the corrosion rate were studied by conducting electrochemical experiments. According to the macroscopic test results, the surface of the tower was covered with a large number of pits and cracks of different depths. Furthermore, based on the metallographic analysis, SEM analysis, and energy spectrum analysis results, it was determined that the crack morphology was mostly intergranular and transgranular. Combined with the test data and process environment, it has been determined that the main forms of corrosion for rectification towers are pitting corrosion and stress corrosion caused by chloride ions. According to the results of electrochemical experiments, the corrosion rate of 316 L stainless steel is negatively correlated with pH value for a pH range of 4–6 at constant temperatures. However, the corrosion rate is positively correlated with temperature for the range of 60 °C–90 °C at constant pH values. From the analysis of the corrosion morphology, the corrosion failure mode of 316 L stainless steel is largely attributed to pitting corrosion when the column is operated at low temperatures (60 °C and 70 °C). However, at high temperatures (90 °C), a transformation from pitting corrosion to stress corrosion occurs along the crystalline form. To ensure the stable operation of the polysilicon rectification tower, this paper proposes corrosion protection measures based on the results of the analysis as described.
AB - Distillation column is a fundamental device for the production of the semiconductor polysilicon. Therefore, investigating corrosion leakage protection of the distillation column is of great significance because of the undetectable yet very significant consequences of corrosion leakage to the column. In this work, corrosion investigation of a polycrystalline silicon rectification tower is presented. The composition and crack morphology of the distillation column (316 L austenitic stainless steel) were detected and analysed using component and hardness analysers. The effects of pH and temperature on the corrosion rate were studied by conducting electrochemical experiments. According to the macroscopic test results, the surface of the tower was covered with a large number of pits and cracks of different depths. Furthermore, based on the metallographic analysis, SEM analysis, and energy spectrum analysis results, it was determined that the crack morphology was mostly intergranular and transgranular. Combined with the test data and process environment, it has been determined that the main forms of corrosion for rectification towers are pitting corrosion and stress corrosion caused by chloride ions. According to the results of electrochemical experiments, the corrosion rate of 316 L stainless steel is negatively correlated with pH value for a pH range of 4–6 at constant temperatures. However, the corrosion rate is positively correlated with temperature for the range of 60 °C–90 °C at constant pH values. From the analysis of the corrosion morphology, the corrosion failure mode of 316 L stainless steel is largely attributed to pitting corrosion when the column is operated at low temperatures (60 °C and 70 °C). However, at high temperatures (90 °C), a transformation from pitting corrosion to stress corrosion occurs along the crystalline form. To ensure the stable operation of the polysilicon rectification tower, this paper proposes corrosion protection measures based on the results of the analysis as described.
KW - Corrosion measures
KW - Electrochemical experiment
KW - Influence factor
KW - Stainless steel
KW - Stress corrosion cracking
UR - http://www.scopus.com/inward/record.url?scp=85078068239&partnerID=8YFLogxK
U2 - 10.1016/j.psep.2020.01.007
DO - 10.1016/j.psep.2020.01.007
M3 - 文章
AN - SCOPUS:85078068239
SN - 0957-5820
VL - 135
SP - 244
EP - 256
JO - Process Safety and Environmental Protection
JF - Process Safety and Environmental Protection
ER -