Exploration of the Mechanism of Acid Tailing on Strong-Base Ion Exchangers: Modeling and Experiment

Jingwei Kou, Chen Chen, Jing Zhang, Houle Xiang, Han Guo, Dan Li, Hui Wang, Jihang Zhang, Pengpeng Yang, Wei Zhuang, Hanjie Ying, Jinglan Wu

Research output: Contribution to journalArticlepeer-review

Abstract

A new DTSD-S model (combining the ion-exclusion chromatography-Donnan model and two-step dissociation of sulfuric acid) was developed herein to predict CP,SO42- and CP,HSO4- in the resin pores during the adsorption and desorption processes. A comparison of CP,SO42- and CP,HSO4- during the desorption process showed that the tailing phenomenon was affected by the acid concentration. When CH+ was lower than 0.9 mol/L, the predominant species in the resin pores was SO42- instead of HSO4-, which verified that the sulfuric acid tailing was caused by SO42-. The results of energy-dispersive spectroscopy and X-ray photoelectron spectroscopy of the resins after adsorption showed the existence of extra S element, which further verified that the existence of SO42- was the main factor that caused the acid tailing. Finally, we concluded that the acid tailing was inevitable and suggested that one could recover a high H2SO4 concentration by using a high feed acid concentration.

Original languageEnglish
Pages (from-to)16875-16885
Number of pages11
JournalIndustrial and Engineering Chemistry Research
Volume62
Issue number41
DOIs
StatePublished - 18 Oct 2023

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