TY - JOUR
T1 - Investigation on discharge characteristics of a coaxial dielectric barrier discharge reactor driven by AC and ns power sources
AU - Wang, Qian
AU - Liu, Feng
AU - Miao, Chuanrun
AU - Yan, Bing
AU - Fang, Zhi
N1 - Publisher Copyright:
© 2018 Hefei Institutes of Physical Science, Chinese Academy of Sciences and IOP Publishing.
PY - 2018/3
Y1 - 2018/3
N2 - A coaxial dielectric barrier discharge (DBD) reactor with double layer dielectric barriers has been developed for exhaust gas treatment and excited either by AC power or nanosecond (ns) pulse to generate atmospheric pressure plasma. The comparative study on the discharge characteristics of the discharge uniformity, power deposition, energy efficiency, and operation temperature between AC and ns pulsed coaxial DBD is carried out in terms of optical and electrical characteristics and operation temperature for optimizing the coaxial DBD reactor performance. The voltages across the air gap and dielectric layer and the conduction and displacement currents are extracted from the applied voltages and measured currents of AC and ns pulsed coaxial DBDs for the calculation of the power depositions and energy efficiencies through an equivalent electrical model. The discharge uniformity and operating temperature of the coaxial DBD reactor are monitored and analyzed by optical images and infrared camera. A heat conduction model is used to calculate the temperature of the internal quartz tube. It is found that the ns pulsed coaxial DBD has a much higher instantaneous power deposition in plasma, a lower total power consumption, and a higher energy efficiency compared with that excited by AC power and is more homogeneous and stable. The temperature of the outside wall of the AC and ns pulse excited coaxial DBD reaches 158 °C and 64.3 °C after 900 s operation, respectively. The experimental results on the comparison of the discharge characteristics of coaxial DBDs excited by different powers are significant for understanding of the mechanism of DBDs, reducing energy loss, and optimizing the performance of coaxial DBD in industrial applications.
AB - A coaxial dielectric barrier discharge (DBD) reactor with double layer dielectric barriers has been developed for exhaust gas treatment and excited either by AC power or nanosecond (ns) pulse to generate atmospheric pressure plasma. The comparative study on the discharge characteristics of the discharge uniformity, power deposition, energy efficiency, and operation temperature between AC and ns pulsed coaxial DBD is carried out in terms of optical and electrical characteristics and operation temperature for optimizing the coaxial DBD reactor performance. The voltages across the air gap and dielectric layer and the conduction and displacement currents are extracted from the applied voltages and measured currents of AC and ns pulsed coaxial DBDs for the calculation of the power depositions and energy efficiencies through an equivalent electrical model. The discharge uniformity and operating temperature of the coaxial DBD reactor are monitored and analyzed by optical images and infrared camera. A heat conduction model is used to calculate the temperature of the internal quartz tube. It is found that the ns pulsed coaxial DBD has a much higher instantaneous power deposition in plasma, a lower total power consumption, and a higher energy efficiency compared with that excited by AC power and is more homogeneous and stable. The temperature of the outside wall of the AC and ns pulse excited coaxial DBD reaches 158 °C and 64.3 °C after 900 s operation, respectively. The experimental results on the comparison of the discharge characteristics of coaxial DBDs excited by different powers are significant for understanding of the mechanism of DBDs, reducing energy loss, and optimizing the performance of coaxial DBD in industrial applications.
KW - coaxial dielectric barrier discharge
KW - discharge characteristics
KW - nanosecond pulse
KW - operation temperature
UR - http://www.scopus.com/inward/record.url?scp=85041425669&partnerID=8YFLogxK
U2 - 10.1088/2058-6272/aaa357
DO - 10.1088/2058-6272/aaa357
M3 - 文章
AN - SCOPUS:85041425669
SN - 1009-0630
VL - 20
JO - Plasma Science and Technology
JF - Plasma Science and Technology
IS - 3
M1 - 035404
ER -