Effect of N2/Ar plasma treatment on the visible light photocatalytic activity of CuO/TiO2

Zhengwei Luo, Hui Jiang, Longzhi Hu, Dan Li, Wenhua Geng, Ping Wei

科研成果: 期刊稿件文章同行评审

9 引用 (Scopus)

摘要

The effect of N2/Ar dielectric barrier discharge plasma on the photocatalytic activity of CuO/TiO2 under visible light irradiation was studied. The photocatalysts were characterized by X-ray diffraction, ultraviolet-visible spectrophotometry, transmission electron microscopy, X-ray photoelectron spectroscopy, and electron paramagnetic resonance spectroscopy. The plasma parameters including gas composition, treatment time, and plasma power were investigated. The activities of the plasma-treated photocatalysts were evaluated by the photodegradation of methyl orange under visible light illumination. The optimal operation conditions were N2:Ar = 8:2, treatment time of 20 min, and a discharge current of 1.0 A. Simulated mercury-containing wastewater was treated by the photocatalysts.

源语言英语
页(从-至)1752-1760
页数9
期刊Chinese Journal of Catalysis
35
10
DOI
出版状态已出版 - 20 10月 2014

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