摘要
Molecular imprinting technology in combination with photodegradation technology was applied to synthetize HPW-CS/TiO2/FACS photocatalysts. The novel photocatalyst could not only exhibit high photocatalytic activity but be easy to reuse because the fly-ash cenospheres (FACS) were adopted for carrier. The compound photocatalyst was characterised by X-ray diffraction, UV–vis diffuse reflectance spectra (UV–vis DRS), Fourier Transform Infra Red spectroscopy and Scanning electron microscopy. Meanwhile, the effects of amount of heteropolyacid, dosage of chitosan and calcination temperature on the photocatalytic activity of the photocatalyst were investigated.
源语言 | 英语 |
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页(从-至) | 647-656 |
页数 | 10 |
期刊 | Materials Technology |
卷 | 32 |
期 | 11 |
DOI | |
出版状态 | 已出版 - 19 9月 2017 |