Short-circuiting in fullerene devices studied by in situ electrical measurement in high vacuum and infrared imaging analysis

H. R. Wu, M. L. Wang, Q. L. Song, Y. Wu, Z. T. Xie, X. D. Gao, X. M. Ding, X. Y. Hou

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摘要

In the present work, current-voltage (I-V) characteristics of fullerene devices (ITO{minus 45 degree rule}C60{minus 45 degree rule}Al) are reexamined by in situ electrical measurement in high vacuum and by infrared imaging analysis. Two kinds of I-V curves are detected: 'ohmic' and nonohmic. Degradation processes of the two different devices are measured, and 'ohmic' degradation processes are ascribed to short-circuiting. ITO{minus 45 degree rule}C60{minus 45 degree rule}Al devices in high vacuum are confirmed to be intrinsically nonohmic. Surface temperature distribution of the two different devices is measured and localized heat is detected further confirming the existence of short-circuiting in 'ohmic' devices. To avoid short-circuit, organic buffers are inserted between fullerene layer and cathode and this is found to be effective.

源语言英语
页(从-至)231-235
页数5
期刊Current Applied Physics
7
3
DOI
出版状态已出版 - 3月 2007
已对外发布

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