摘要
Graphene oxide (GO) sheet is used as a novel substrate for dip-pen nanolithography (DPN). After GO is transferred onto SiO2 using the Langmuir-Blodgett technique, CoCl2 is patterned on both GO and exposed SiO2 substrates simultaneously by DPN, which is used for growth of different structured carbon nanotubes.
源语言 | 英语 |
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页(从-至) | 10070-10072 |
页数 | 3 |
期刊 | Chemical Communications |
卷 | 47 |
期 | 36 |
DOI | |
出版状态 | 已出版 - 28 9月 2011 |
已对外发布 | 是 |