Centimeter-scale subwavelength photolithography using metal-coated elastomeric photomasks with modulated light intensity at the oblique sidewalls

Jin Wu, Yayuan Liu, Yuanyuan Guo, Shuanglong Feng, Binghua Zou, Hui Mao, Cheng Han Yu, Danbi Tian, Wei Huang, Fengwei Huo

Research output: Contribution to journal › Article › peer-review

9 Scopus citations

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Material Science