Abstract
Inspired by the commonly seen “milk skin” phenomenon, a general scheme, namely, a “colloid skin”-regulated assembly route, is demonstrated for colloidal film deposition, which easily suppresses the ubiquitous coffee ring effect accompanying the asymmetrical evaporation processes, implying an alternative colloidal film-forming strategy.
Original language | English |
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Pages (from-to) | 90-96 |
Number of pages | 7 |
Journal | Materials Horizons |
Volume | 6 |
Issue number | 1 |
DOIs | |
State | Published - Jan 2019 |