TY - JOUR
T1 - Magnetron sputtering NiO x for perovskite solar cells
AU - Shen, Xiangyi
AU - Ke, Xinwu
AU - Xia, Yingdong
AU - Guo, Qingxun
AU - Chen, Yonghua
N1 - Publisher Copyright:
© 2025 Chinese Institute of Electronics.
PY - 2025/5/1
Y1 - 2025/5/1
N2 - Perovskite solar cells (PSCs) have become a hot topic in the field of renewable energy due to their excellent power conversion efficiency and potential for low-cost manufacturing. The hole transport layer (HTL), as a key component of PSCs, plays a crucial role in the cell's overall performance. Magnetron sputtering NiOx has attracted widespread attention due to its high carrier mobility, excellent stability, and suitability for large-scale production. Herein, an insightful summary of the recent progress of magnetron sputtering NiOx as the HTL of PSCs is presented to promote its further development. This review summarized the basic properties of magnetron sputtering NiOx thin film, the key parameters affecting the optoelectronic properties of NiOx thin films during the magnetron-sputtering process, and the performance of the corresponding PSCs. Special attention was paid to the interfacial issues between NiOx and perovskites, and the modification strategies were systematically summarized. Finally, the challenges of sputtering NiOx technology and the possible development opportunities were concluded and discussed.
AB - Perovskite solar cells (PSCs) have become a hot topic in the field of renewable energy due to their excellent power conversion efficiency and potential for low-cost manufacturing. The hole transport layer (HTL), as a key component of PSCs, plays a crucial role in the cell's overall performance. Magnetron sputtering NiOx has attracted widespread attention due to its high carrier mobility, excellent stability, and suitability for large-scale production. Herein, an insightful summary of the recent progress of magnetron sputtering NiOx as the HTL of PSCs is presented to promote its further development. This review summarized the basic properties of magnetron sputtering NiOx thin film, the key parameters affecting the optoelectronic properties of NiOx thin films during the magnetron-sputtering process, and the performance of the corresponding PSCs. Special attention was paid to the interfacial issues between NiOx and perovskites, and the modification strategies were systematically summarized. Finally, the challenges of sputtering NiOx technology and the possible development opportunities were concluded and discussed.
KW - magnetron sputtering
KW - NiO
KW - perovskite
KW - solar cells
UR - http://www.scopus.com/inward/record.url?scp=105005736193&partnerID=8YFLogxK
U2 - 10.1088/1674-4926/24100032
DO - 10.1088/1674-4926/24100032
M3 - 文献综述
AN - SCOPUS:105005736193
SN - 1674-4926
VL - 46
JO - Journal of Semiconductors
JF - Journal of Semiconductors
IS - 5
M1 - 051803
ER -