TY - JOUR
T1 - Microsecond pulse gas–liquid discharges in atmospheric nitrogen and oxygen
T2 - Discharge mode, stability, and plasma characteristics
AU - Wang, Sen
AU - Liu, Yawei
AU - Zhou, Renwu
AU - Liu, Feng
AU - Fang, Zhi
AU - Ostrikov, Kostya
AU - Cullen, Patrick J.
N1 - Publisher Copyright:
© 2020 Wiley-VCH GmbH
PY - 2021/2
Y1 - 2021/2
N2 - A plasma's working gas is a significant factor affecting their discharge characteristics and the induced chemistries during plasma–water interactions. However, the effects on the discharge mode and discharge stability have not been fully investigated. This study focuses on the discharge mode transition and stability with nitrogen and oxygen gases. Compared with the oxygen discharge, the nitrogen discharge remained stable over a larger voltage range and long duration time. A diffuse mode discharge had better stability and lower plasma activity for both nitrogen and oxygen gases, whereas a transient spark mode in nitrogen and filament mode in oxygen had lower stability but a higher plasma activity. This study improves the understanding of the physicochemical processes of plasma–water interactions.
AB - A plasma's working gas is a significant factor affecting their discharge characteristics and the induced chemistries during plasma–water interactions. However, the effects on the discharge mode and discharge stability have not been fully investigated. This study focuses on the discharge mode transition and stability with nitrogen and oxygen gases. Compared with the oxygen discharge, the nitrogen discharge remained stable over a larger voltage range and long duration time. A diffuse mode discharge had better stability and lower plasma activity for both nitrogen and oxygen gases, whereas a transient spark mode in nitrogen and filament mode in oxygen had lower stability but a higher plasma activity. This study improves the understanding of the physicochemical processes of plasma–water interactions.
UR - http://www.scopus.com/inward/record.url?scp=85092018944&partnerID=8YFLogxK
U2 - 10.1002/ppap.202000135
DO - 10.1002/ppap.202000135
M3 - 文章
AN - SCOPUS:85092018944
SN - 1612-8850
VL - 18
JO - Plasma Processes and Polymers
JF - Plasma Processes and Polymers
IS - 2
M1 - 2000135
ER -