Research on antireflection characteristic of rectangular subwavelength surface-relief structure

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Abstract

In this paper, using effective-medium theory (EMT) and finite different time domain (FDTD), the dependence of reflectivity to 1.06 μm incident light upon structural parameters of rectangular subwavelength surface-relief structure has been discussed, the reliability of FDTD has been proved, and the validity of the two theories has been contrasted. The influence of refractive index and filled factor to reflectivity has been analyzed detailedly. And the structural parameters also have been discussed by diffraction orders in the energy field of reflective area with FDTD. The results shows that the best filled factor is near 0.7, the structure periods should less than 0.6λ, and the structure thickness would be set to λ/4neff. It can be used as the basis for design and fabrication of surface structural materials with proper antireflection property.

Original languageEnglish
Title of host publication4th International Symposium on Advanced Optical Manufacturing and Testing Technologies
Subtitle of host publicationAdvanced Optical Manufacturing Technologies
DOIs
StatePublished - 2009
Event4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies - Chengdu, China
Duration: 19 Nov 200821 Nov 2008

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume7282
ISSN (Print)0277-786X

Conference

Conference4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
Country/TerritoryChina
CityChengdu
Period19/11/0821/11/08

Keywords

  • Antireflection
  • Effective medium theory
  • Finite different time domain
  • Subwavelength

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