Scalable solid-template reduction for designed reduced graphene oxide architectures

Jun Chen; Roderick L. Shepherd; Joselito M. Razal; Xiao Huang; Weimin Zhang; Jie Zhao; Andrew T. Harris; Shu Wang; Andrew I. Minett; Hua Zhang

doi:10.1021/am402084y

Scalable solid-template reduction for designed reduced graphene oxide architectures

Jun Chen, Roderick L. Shepherd, Joselito M. Razal, Xiao Huang, Weimin Zhang, Jie Zhao, Andrew T. Harris, Shu Wang, Andrew I. Minett, Hua Zhang

Research output: Contribution to journal › Article › peer-review

13 Scopus citations

Abstract

Herein, we report a solid-state reduction process (in contrast to solution-based approach) by using an environmentally friendly reductant, such as vitamin C (denoted VC), to be directly employed to solid-state graphene oxide (GO) templates to give the highly active rGO architecture with a sheet resistance of as low as 10 Ω sq^-1. In addition, predesigned rGO patterns/tracks with tunable resistivity can be directly "written" on a preprepared solid GO film via the inkjet-printing technique using VC/H ₂O as the printing-ink. This advanced reduction process allows foreign active materials to be preincorporated into the GO matrix to form quality active composite architectures.

Original language	English
Pages (from-to)	7676-7681
Number of pages	6
Journal	ACS Applied Materials and Interfaces
Volume	5
Issue number	16
DOIs	https://doi.org/10.1021/am402084y
State	Published - 28 Aug 2013
Externally published	Yes

Keywords

graphene oxide
inkjet printing
reduced graphene oxide
solid-state reduction
vitamin C

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10.1021/am402084y

Cite this

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AU - Chen, Jun

AU - Shepherd, Roderick L.

AU - Razal, Joselito M.

AU - Huang, Xiao

AU - Zhang, Weimin

AU - Zhao, Jie

AU - Harris, Andrew T.

AU - Wang, Shu

AU - Minett, Andrew I.

AU - Zhang, Hua

PY - 2013/8/28

Y1 - 2013/8/28

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AB - Herein, we report a solid-state reduction process (in contrast to solution-based approach) by using an environmentally friendly reductant, such as vitamin C (denoted VC), to be directly employed to solid-state graphene oxide (GO) templates to give the highly active rGO architecture with a sheet resistance of as low as 10 Ω sq-1. In addition, predesigned rGO patterns/tracks with tunable resistivity can be directly "written" on a preprepared solid GO film via the inkjet-printing technique using VC/H 2O as the printing-ink. This advanced reduction process allows foreign active materials to be preincorporated into the GO matrix to form quality active composite architectures.

KW - graphene oxide

KW - inkjet printing

KW - reduced graphene oxide

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KW - vitamin C

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Scalable solid-template reduction for designed reduced graphene oxide architectures

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Keywords

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