Single-layer graphene oxide sheet: A novel substrate for dip-pen nanolithography

Hai Li; Xiehong Cao; Bing Li; Xiaozhu Zhou; Gang Lu; Cipto Liusman; Qiyuan He; Freddy Boey; Subbu S. Venkatraman; Hua Zhang

doi:10.1039/c1cc12648b

Single-layer graphene oxide sheet: A novel substrate for dip-pen nanolithography

Hai Li, Xiehong Cao, Bing Li, Xiaozhu Zhou, Gang Lu, Cipto Liusman, Qiyuan He, Freddy Boey, Subbu S. Venkatraman, Hua Zhang

Nanyang Technological University

Research output: Contribution to journal › Article › peer-review

17 Scopus citations

Abstract

Graphene oxide (GO) sheet is used as a novel substrate for dip-pen nanolithography (DPN). After GO is transferred onto SiO₂ using the Langmuir-Blodgett technique, CoCl₂ is patterned on both GO and exposed SiO₂ substrates simultaneously by DPN, which is used for growth of different structured carbon nanotubes.

Original language	English
Pages (from-to)	10070-10072
Number of pages	3
Journal	Chemical Communications
Volume	47
Issue number	36
DOIs	https://doi.org/10.1039/c1cc12648b
State	Published - 28 Sep 2011
Externally published	Yes

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title = "Single-layer graphene oxide sheet: A novel substrate for dip-pen nanolithography",

abstract = "Graphene oxide (GO) sheet is used as a novel substrate for dip-pen nanolithography (DPN). After GO is transferred onto SiO2 using the Langmuir-Blodgett technique, CoCl2 is patterned on both GO and exposed SiO2 substrates simultaneously by DPN, which is used for growth of different structured carbon nanotubes.",

author = "Hai Li and Xiehong Cao and Bing Li and Xiaozhu Zhou and Gang Lu and Cipto Liusman and Qiyuan He and Freddy Boey and Venkatraman, {Subbu S.} and Hua Zhang",

year = "2011",

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doi = "10.1039/c1cc12648b",

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T2 - A novel substrate for dip-pen nanolithography

AU - Li, Hai

AU - Cao, Xiehong

AU - Li, Bing

AU - Zhou, Xiaozhu

AU - Lu, Gang

AU - Liusman, Cipto

AU - He, Qiyuan

AU - Boey, Freddy

AU - Venkatraman, Subbu S.

AU - Zhang, Hua

PY - 2011/9/28

Y1 - 2011/9/28

N2 - Graphene oxide (GO) sheet is used as a novel substrate for dip-pen nanolithography (DPN). After GO is transferred onto SiO2 using the Langmuir-Blodgett technique, CoCl2 is patterned on both GO and exposed SiO2 substrates simultaneously by DPN, which is used for growth of different structured carbon nanotubes.

AB - Graphene oxide (GO) sheet is used as a novel substrate for dip-pen nanolithography (DPN). After GO is transferred onto SiO2 using the Langmuir-Blodgett technique, CoCl2 is patterned on both GO and exposed SiO2 substrates simultaneously by DPN, which is used for growth of different structured carbon nanotubes.

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U2 - 10.1039/c1cc12648b

DO - 10.1039/c1cc12648b

M3 - 文章

C2 - 21829792

AN - SCOPUS:80052314312

SN - 1359-7345

VL - 47

SP - 10070

EP - 10072

JO - Chemical Communications

JF - Chemical Communications

IS - 36

ER -

Single-layer graphene oxide sheet: A novel substrate for dip-pen nanolithography

Abstract

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