A robust approach for the growth of epitaxial spinel ferrite films

J. X. Ma; D. Mazumdar; G. Kim; H. Sato; N. Z. Bao; A. Gupta

doi:10.1063/1.3488638

A robust approach for the growth of epitaxial spinel ferrite films

J. X. Ma, D. Mazumdar, G. Kim, H. Sato, N. Z. Bao, A. Gupta

University of Alabama

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Heteroepitaxial spinel ferrites NiFe₂ O₄ and CoFe₂ O₄ films have been prepared by pulsed laser deposition at various temperatures (175-690 °C) under ozone/oxygen pressure of 10 mTorr. Due to enhanced kinetic energy of ablated species at low pressure and enhanced oxidation power of ozone, epitaxy has been achieved at significantly lower temperatures than previously reported. Films grown at temperature below 550 °C show a novel growth mode, which we term "vertical step-flow" growth mode. Epitaxial spinel ferrite films with atomically flat surface over large areas and enhanced magnetic moment can be routinely obtained. Interestingly, the growth mode is independent of the nature of substrate (spinel MgAl₂ O₄, perovskite SrTiO ₃, and rock-salt MgO) and film thickness. The underlying growth mechanism is discussed.

源语言	英语
文章编号	063917
期刊	Journal of Applied Physics
卷	108
期	6
DOI	https://doi.org/10.1063/1.3488638
出版状态	已出版 - 15 9月 2010
已对外发布	是

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@article{8e87508c9f69428d8637bd7a374ae5ad,

title = "A robust approach for the growth of epitaxial spinel ferrite films",

abstract = "Heteroepitaxial spinel ferrites NiFe2 O4 and CoFe2 O4 films have been prepared by pulsed laser deposition at various temperatures (175-690 °C) under ozone/oxygen pressure of 10 mTorr. Due to enhanced kinetic energy of ablated species at low pressure and enhanced oxidation power of ozone, epitaxy has been achieved at significantly lower temperatures than previously reported. Films grown at temperature below 550 °C show a novel growth mode, which we term {"}vertical step-flow{"} growth mode. Epitaxial spinel ferrite films with atomically flat surface over large areas and enhanced magnetic moment can be routinely obtained. Interestingly, the growth mode is independent of the nature of substrate (spinel MgAl2 O4, perovskite SrTiO 3, and rock-salt MgO) and film thickness. The underlying growth mechanism is discussed.",

author = "Ma, {J. X.} and D. Mazumdar and G. Kim and H. Sato and Bao, {N. Z.} and A. Gupta",

year = "2010",

month = sep,

day = "15",

doi = "10.1063/1.3488638",

language = "英语",

volume = "108",

journal = "Journal of Applied Physics",

issn = "0021-8979",

publisher = "American Institute of Physics",

number = "6",

}

TY - JOUR

T1 - A robust approach for the growth of epitaxial spinel ferrite films

AU - Ma, J. X.

AU - Mazumdar, D.

AU - Kim, G.

AU - Sato, H.

AU - Bao, N. Z.

AU - Gupta, A.

PY - 2010/9/15

Y1 - 2010/9/15

N2 - Heteroepitaxial spinel ferrites NiFe2 O4 and CoFe2 O4 films have been prepared by pulsed laser deposition at various temperatures (175-690 °C) under ozone/oxygen pressure of 10 mTorr. Due to enhanced kinetic energy of ablated species at low pressure and enhanced oxidation power of ozone, epitaxy has been achieved at significantly lower temperatures than previously reported. Films grown at temperature below 550 °C show a novel growth mode, which we term "vertical step-flow" growth mode. Epitaxial spinel ferrite films with atomically flat surface over large areas and enhanced magnetic moment can be routinely obtained. Interestingly, the growth mode is independent of the nature of substrate (spinel MgAl2 O4, perovskite SrTiO 3, and rock-salt MgO) and film thickness. The underlying growth mechanism is discussed.

AB - Heteroepitaxial spinel ferrites NiFe2 O4 and CoFe2 O4 films have been prepared by pulsed laser deposition at various temperatures (175-690 °C) under ozone/oxygen pressure of 10 mTorr. Due to enhanced kinetic energy of ablated species at low pressure and enhanced oxidation power of ozone, epitaxy has been achieved at significantly lower temperatures than previously reported. Films grown at temperature below 550 °C show a novel growth mode, which we term "vertical step-flow" growth mode. Epitaxial spinel ferrite films with atomically flat surface over large areas and enhanced magnetic moment can be routinely obtained. Interestingly, the growth mode is independent of the nature of substrate (spinel MgAl2 O4, perovskite SrTiO 3, and rock-salt MgO) and film thickness. The underlying growth mechanism is discussed.

UR - http://www.scopus.com/inward/record.url?scp=77957732877&partnerID=8YFLogxK

U2 - 10.1063/1.3488638

DO - 10.1063/1.3488638

M3 - 文章

AN - SCOPUS:77957732877

SN - 0021-8979

VL - 108

JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 6

M1 - 063917

ER -

A robust approach for the growth of epitaxial spinel ferrite films

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