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南京工业大学 国内
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Effects of O
2
addition on the plasma uniformity and reactivity of Ar DBD excited by ns pulsed and AC power supplies
Feng Liu
, Yue Zhuang, Yulei Zhao, Jie Chen,
Zhi Fang
电气工程与控制科学学院
Nanjing Tech University
科研成果
:
期刊稿件
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文章
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同行评审
16
引用 （Scopus）
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2
addition on the plasma uniformity and reactivity of Ar DBD excited by ns pulsed and AC power supplies' 的科研主题。它们共同构成独一无二的指纹。
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Engineering
Carrier Concentration
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