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南京工业大学 国内
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Investigation of HfN
x
-based films by Rutherford backscattering spectrometry and X-ray reflectometry
Chang Chun Chen, Ping Liu,
Chun Hua Lu
材料科学与工程学院
Nanjing Tech University
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x
-based films by Rutherford backscattering spectrometry and X-ray reflectometry' 的科研主题。它们共同构成独一无二的指纹。
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Engineering
Atomic Force Microscopy
50%
Elevated Temperature
50%
Metal Organic Chemical Vapor Deposition
50%
Root Mean Square
50%
Silicon Dioxide
100%
Square Roughness
50%
Structural Parameter
50%
Earth and Planetary Sciences
Backscattering
100%
Hafnium
33%
Metalorganic Chemical Vapor Deposition
33%
Reflectometry
100%
Chemical Engineering
Chemical Vapor Deposition
20%
Film
100%
Hafnium
20%
Spectrometry
100%
Vapor Deposition
20%
Physics
Backscattering
100%
Hafnium
33%
Metalorganic Chemical Vapor Deposition
33%
Material Science
Rutherford Backscattering Spectrometry
100%