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Optimized design of block copolymers with covarying properties for nanolithography
Hongbo Feng, Moshe Dolejsi, Ning Zhu, Soonmin Yim, Whitney Loo, Peiyuan Ma, Chun Zhou, Gordon S.W. Craig, Wen Chen, Lei Wan, Ricardo Ruiz, Juan J. de Pablo, Stuart J. Rowan, Paul F. Nealey
Research output: Contribution to journal › Article › peer-review