Optimized design of block copolymers with covarying properties for nanolithography

Hongbo Feng, Moshe Dolejsi, Ning Zhu, Soonmin Yim, Whitney Loo, Peiyuan Ma, Chun Zhou, Gordon S.W. Craig, Wen Chen, Lei Wan, Ricardo Ruiz, Juan J. de Pablo, Stuart J. Rowan, Paul F. Nealey